This section provides technical articles and practical guides on shadow masks (deposition masks) for thin-film fabrication, covering material selection, pattern design, thickness tolerance, alignment accuracy, and compatibility with PVD, sputtering, and evaporation systems. It is intended for researchers and engineers working in microfabrication, vacuum deposition, and prototype device development.
A practical guide to ordering custom photomasks for lithography and microfabrication,covering materials, feature sizes, mask polarity, file formats, and alignment requirements.
Thick stainless steel shadow masks (0.3–0.5 mm) offer mechanical stability but cannot achieve high-resolution micro-patterns. This article explains why aspect ratio, laser cutting physics, and heat effects prevent thi...
For high-resolution micro-patterns and rapid custom fabrication, laser cutting provides better accuracy, tighter tolerances, and lower cost compared to chemical etching. Etching is suitable for medium-sized features a...
This guide explains the minimum feature size, tolerance limits, and design constraints for laser-cut stainless steel shadow masks used in PVD, CVD, and sputtering systems, helping research labs design manufacturable m...
