Custom Optical Photomasks for Chrome, Quartz & Mylar

We provide custom optical photomasks for photolithography, microfabrication, MEMS, microfluidics, optics, and semiconductor R&D. We support common mask formats including chrome-on-glass, chrome-on-quartz, and polymer (Mylar) masks, with options for positive/negative tone, binary patterns, and custom alignment features.

Our photomask service is designed for fast prototyping and research production, helping you translate CAD layouts into manufacturable masks with practical guidance on line widths, clearances, and process limitations.

Photomask Types We Support

• Chrome-on-glass masks (cost-effective for many labs)
• Chrome-on-quartz masks (better UV transmission and stability)
• Mylar / film masks (rapid and economical for lower-resolution needs)
• Custom aperture masks / shadow-mask-like patterns (application dependent)

Photomask Specifications

• Material: High-quality quartz or soda-lime glass
• Coating: Chromium (Cr) with optional anti-reflection coating
• Resolution: Down to 1–5 µm depending on pattern complexity
• Critical dimension tolerance: ±0.5–1 µm
• Feature types: Lines, grids, microchannels, electrodes, logos, IC layouts
• Mask sizes: 2", 3", 4", 5", 7", 9", 12" or fully custom sizes