Custom High-Resolution Shadow Mask – Sub-10 µm Features

Our custom high-resolution shadow masks are designed for precision thin-film patterning, microfabrication, and research applications. For qualified designs, minimum openings or gaps below 10 µm can be achieved. The example shown in the product image includes measured features of approximately 7.2 µm and 8.8 µm.

Key Features

• Sub-10 µm minimum features available for qualified designs
• Custom aperture shapes, patterns, alignment marks, and mask dimensions
• Available materials include stainless steel, molybdenum, tungsten, and other metals
• Custom material thickness and manufacturing tolerances
• Flat masks and framed mask assemblies are available
• Suitable for thermal evaporation, electron-beam evaporation, sputtering, and other PVD processes
• Design review and final drawing approval before manufacturing

Important Design Information

The achievable minimum feature size depends on the mask material, thickness, overall dimensions, aperture geometry, pattern density, and required tolerances. Sub-10 µm resolution is not available for every design. Our engineering team will review your drawing and confirm manufacturability before providing a quotation.

How to Order

Please contact us before placing an order and provide the following information:

• CAD file in DXF, DWG, or GDS format; clearly dimensioned drawings are also accepted
• Overall mask dimensions
• Material and thickness
• Minimum opening or gap size
• Required tolerances
• Frame requirements, if applicable
• Quantity

This is a fully customized product. Pricing and lead time will be determined after reviewing your design. A final manufacturing drawing will be sent to you for approval before production begins.